The ever-shrinking features of transistors etched in silicon have always required pushing the cutting edge of manufacturing technology. The discovery of atomically thin materials like graphene and ...
The chipmaker says that the futuristic transistor, designed to let electricity flow more freely inside chips, is moving closer to reality. Michael Kanellos is editor at large at CNET News.com, where ...
SANTA CLARA, Calif.--(BUSINESS WIRE)--July 12, 2005--Applied Materials, Inc. today launched the industry's most advanced silicon etch technology, the Applied Centura(R) AdvantEdge(TM) system, ...
A team of scientists from the Institute for Basic Science has developed a revolutionary technique for producing 1D metallic materials with a width of less than 1 nm by epitaxial growth. Using this ...
You don’t have to look very far in the semiconductor world before you see the word “scaling.” Perhaps you read an industry news article headline about transistor scaling – how those nearly nanoscale ...
This figure depicts the synthesis of metallic 1D mirror twin boundaries through Van der Waals epitaxial growth (top) and the large-area 2D semiconductor integrated circuit constructed based on these ...
One can classify the characterization and metrology requirements for integrated circuits beyond the 65-nm node as the measurement of nanoelectronics. Two interesting aspects to future measurement ...
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MIT finds a new way to pack more transistors on a chip
For decades, chipmakers have squeezed more computing power out of silicon by shrinking transistors, but that strategy is running into hard physical limits. A new approach from MIT aims to sidestep ...
IBM and Samsung have teased a new vertical transistor design "breakthrough" they reckon could transform the semiconductor industry and give Moore's Law a few years' more life. The companies hailed the ...
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